MEIKIKOU CORPORATION
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CLEAN FLOW SYSTEM
Clean Loader Unloader
Clean Buffer
Clean Robot
Robot to be available for the fifth generation glass substrates
Robot to be available for the sixth and seventh generation glass substrates
Clean Exchanger
EFEM designed for 300mm (MEF series)
Load Port designed for 300mm FOUP (Comply with SEMI)
Handling Robot for wafer 300mm
Scissor Lifts
Conveyor System
Contact
Load Port designed for 300mm FOUP (Comply with SEMI)

Clean Flow System, Handling systems for wafer
Clean Flow System, Handling systems for wafer A ratch-key with the original over-rotation mechanism can drastically decrease docking misses. The machine structure is easy to reproduce a previous setup for substituting parts. Maintenance from the front side is also available.

Features
Specification MLP-FA3001
Cleanliness Class1@(0.1μm)
Weight 78Kg
Stroke Docking 70mm
Port Door Open/Close 40mm
Port Door Up/Down 360mm
Cycle time
Load 12s
Unload 10s
Utility AC100V
Dry Air: over 0.55MPa
Vacuum: over 50kPa
PWP below 0.001

* For further information about Handling system for wafer, Load port, do not hesitate to contact us:
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